Conductor Etch System M-8000 Series is utilized for hard mask and silicon etching for 32nm and beyond. Hitachi High-Tech developed new process flows, such as double patterning and new material etch processes such as high-k dielectric/metal gate through JDP (Joint Development Program) with device
Conductor Etch System M-8000 Series is utilized for hard mask and silicon etching for 32nm and beyond.
Hitachi High-Tech developed new process flows, such as double patterning and new material etch processes such as high-k dielectric/metal gate
7. Etch System - What is an Etch System? : Hitachi High-Tech Corporation
7. Etch System - What is an Etch System? : Hitachi High-Tech Corporation
Plasma Etch Equipment
Fabrication and evaluation of aluminum nitride based MEMS piezoelectric vibration sensors for large-amplitude vibration applications
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Semiconductor Device Manufacturing & Inspection Equipment : Products : Hitachi Review
Micromachines, Free Full-Text
Micromachines, Free Full-Text
Etch Tactras™ Series, Products and Service(products)
Semiconductor Manufacturing & Inspection Equipment : Electronic Systems & Equipment : Hitachi Review
7. Etch System - What is an Etch System? : Hitachi High-Tech Corporation
Ion beam etching machine : Hitachi High-Tech Corporation
Hitachi High-Tech Europe GmbH: Metrology - Laboratory - DirectIndustry
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Plasma wafer etching machine - M-8000 series - Hitachi High-Tech Europe GmbH - for the microelectronics industry